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ChemicalsResist / Etching → RapidMask Dry Process Sandcarving Resist
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RapidMask Dry Process Sandcarving Resist
by PhotoBrasive Systems








RapidMask HD, 10"x12", 10/box
Price: $99.95 (USD)
Qty:  Add to Cart   Add to Wish List
SKU: 273801





RapidMask HD, 10"x12", 25/box
Price: $167.55 (USD)
Qty:  Add to Cart   Add to Wish List
SKU: 273802





RapidMask II, 10"x12", 10/box
Price: $109.95 (USD)
Qty:  Add to Cart   Add to Wish List
SKU: 273803





RapidMask II, 10"x12", 25/box
Price: $203.55 (USD)
Qty:  Add to Cart   Add to Wish List
SKU: 273804



EXPOSE-APPLY-BLAST. The only photo resist film on the market today that requires absolutely no water development. This innovative photo resist film offers extreme resolution and a vivid printout image that provides an effortless sandcarving experience.

It is self-adhesive, slip and carrier sheet removal is effortless, and has fine halftone making ability.

Use RapidMask HD, 2 mil for high detail halftones. RapidMask Version II, 4 mil with strong blast resistance allows deeper etching.

RAPIDMASK ART SPECIFICATIONS GENERAL:
- RapidMask requires photo-NEGATIVE artwork. CLEAR = BLAST.
- Typically, artwork imaged area should not exceed RapidMask film sheet or roll size.
- IMAGED AREAS OF Artwork should have opaque borders (approx. 1/8 inch).
- RapidMask film remains photosensitive through blasting if not protected from light.

RESOLUTION:
Minimum line resolution
- RapidMask HD (High Detail) – 2mil (use minimum 180 (220 opt.) grit size and negative artwork with Dmax 3.0)
- RapidMask II (High Tack) – 4mil (use minimum 180 grit size and negative art work with Dmax 3.0)

Halftones
- RapidMask HD (High Detail) – up to 65dpi (use minimum 180 grit to 45dpi – 220 or finer above 45dpi)

MASK SPECIFICATIONS:
Blast depth
- RapidMask HD (High Detail, 50u) – frost to approx. 1/16"
- RapidMask II (High Tack, 100u) – frost to approx. 3/16"
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